SOH is an ancillary material to form micro pattern in semiconductor. It requires high etching-resistance for it fills a gap to flatten the surface. SOH developed by SDI Material division is a material that is used for the new coating method in the patterning process of semiconductor. It forms a thin film not by the existing method of *evaporation but by a new method of spin coating, which increases the accuracy of micro patterns.* evaporation processevaporation is the method of thin-film fabrication. The source metal is heated to a high temperature to make it evaporated. And then the vapor particles travel directly to the target object (substrate) where they condense back to a solid state.
The existing CVD (Chemical Vapor evaporation) process for forming thin film is insufficient to meet the quality requirement for the micro patterns, but has high investment costs for its equipment. Samsung SDI’s SOH is a key material that enables significant improvement of quality and productivity, as well as cost reduction for equipment investment, for SOH is used for spin-coating process to form membrane.
High affinity with the existing process materials
Ensuring consistent quality for 3 months at room temperature